HBO (Microlithography)

HBO Microlithography Lamps for ASML i-line Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for ASML i-line Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with ASML

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HBO Microlithography Lamps for Canon i-line Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for Canon i-line Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Canon

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HBO Microlithography Lamps for Nikon i-line Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for Nikon i-line Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Nikon

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HBO Microlithography Lamps for Canon FPD Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for Canon FPD Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Canon

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HBO Microlithography Lamps for Süss Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for Süss Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Süss

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HBO Microlithography Lamps for Other Systems
Aree applicative
  • Microlithography

HBO Microlithography Lamps for Other Systems

Caratteristiche prodotto
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with major microlithography equipment manufacturers

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